Contrastive Research on Electrical Contact Performance for Contact Materials of Cu-SnO2 and Cu-ZnO2 Alloys
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چکیده
منابع مشابه
Ohmic Contact of Cu/Mo and Cu/Ti Thin Layers on Multi-Crystalline Silicon Substrates
Cu-Mo and Cu-Ti contact structures were fabricated on multi-crystalline silicon substrates to provide a low resistance ohmic contact. Deposition steps are done in an excellent vacuum chamber by means of electron beam evaporation and samples are then annealed for the realization of an efficient alloy layer. The effects of process parameters such as film thickness, annealing duration and temp...
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cu-mo and cu-ti contact structures were fabricated on multi-crystalline silicon substrates to provide a low resistance ohmic contact. deposition steps are done in an excellent vacuum chamber by means of electron beam evaporation and samples are then annealed for the realization of an efficient alloy layer. the effects of process parameters such as film thickness, annealing duration and temperat...
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The flow of electrical current through a microscopic actual contact spot between two conductors is influenced by the flow through adjacent contact spots. A smoothed version of this interaction effect is developed and used to predict the contact resistance when the statistical size and spatial distribution of contact spots is known. To illustrate the use of the method, an idealized fractal rough...
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ژورنال
عنوان ژورنال: Materials Research
سال: 2019
ISSN: 1980-5373,1516-1439
DOI: 10.1590/1980-5373-mr-2018-0901